MM Double-tank cell 2 x 15 mL - Magnetic Mount Double-tank Etch Cell BDD ) can be easily punched

) can be easily punched from the metal foil and directly loaded into cell

If air bubbles are present around the porous frit

The cell elements are constructed with inert materials to the sample (PEEK)

5 mWattmin

The reference electrode tip should be placed close to the bottom of the chamber

MM Double-tank cell 2 x 15 mL - Magnetic Mount Double-tank Etch Cell BDD ) can be easily punchedThis is a horizontally mounted, double tank cell typically used for anodization of Si wafers with electrolyte backside contact. It consists of two polyether ether ketone (PEEK) gas tight chambers each equipped with sapphire wafer serving as window for illumination allowing light assisted porous Si formation. It well fits aqueous (FKM EPDM O Rings) and organic solvent (FFKM O Rings) electrolyte requirements. The Si substrate is mounted in between these